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TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use

Summary by Tom's Hardware
TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033.
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Tom's HardwareTom's Hardware

TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use

TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033.

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Tom's Hardware broke the news on Tuesday, September 8, 2026.
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