Samsung, ASML Team up on Next-Generation Semiconductor Manufacturing Technology
7 Articles
7 Articles
The Korea Times
연합뉴스-Yonhap News AgencySamsung, ASML team up on next-generation semiconductor manufacturing technology
Samsung Electronics said Tuesday that it has joined a consortium led by Netherlands-based semiconductor equipment manufacturer ASML to develop next-generation semiconductor manufacturing technologies. The partnership aims to advance 12-inch photomask technology for future semiconductor manufacturing, replacing the 6-inch photomask format that has been widely used for decades, the Korean technology giant said. "Building on years of successful coo…
Samsung Electronics has joined hands with ASML, a semiconductor lithography equipment manufacturer, to jointly develop next-generation semiconductor manufacturing technology. Furthermore, the company plans to begin mass production of actual DRAM memory starting in 2028 by being the first to apply the company's cutting-edge equipment early. ASML manufactures ultra-fine semiconductors.
Samsung Electronics will apply 'High NA Extreme Ultraviolet (EUV),' a next-generation lithography equipment, to the production of advanced DRAM by 2028. This marks the first time Samsung Electronics is applying High NA EUV to actual mass production of DRAM. On the 8th, Samsung Electronics announced that it is expanding cooperation with the Dutch semiconductor equipment manufacturer ASML to introduce High NA EUV into advanced DRAM manufacturing b…
[Digital Daily Reporter Ko Seong-hyeon] Samsung Electronics is expanding its cooperation with ASML, the Netherlands' largest semiconductor equipment manufacturer, on next-generation semiconductor manufacturing technology. While participating in a global consortium for the transition to 12-inch photomasks, the company plans to introduce High-NA Extreme Ultraviolet (High-NA) lithography to advanced DRAM manufacturing for the first time in the indu…
Samsung Electronics, in partnership with ASML, is setting out to establish a next-generation manufacturing standard by expanding the 6-inch photomask, which has been used as the standard for semiconductor lithography processes for decades, to 12 inches. In line with the introduction of High-NA Extreme Ultraviolet (High-NA) lithography equipment, the company is participating in the establishment of a large-scale photomask ecosystem and plans to v…
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