US EditionScalable Approach For Fabricating Sub-10nm Nanogaps
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Plato. Vertical Search. Ai. | PlatoAiStream. Data Intelligence. Vertical Search. Ai.Scalable Approach For Fabricating Sub-10nm Nanogaps
A new technical paper titled “A progressive wafer scale approach for Sub-10 nm nanogap structures” was published by researchers at Seoul National University, Chung-Ang University, Mohammed VI Polytechnic University and Ulsan National Institute of Science and Technology. “We have advanced the atomic layer lithography method into an efficient, scalable approach for fabricating sub-10 nm nanogaps with high uniformity across entire wafer areas,” sta…
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