Kyocera and Tohoku University's Research Institute of Electrical Communication have jointly developed, for the first time in the world, a technology to integrate optical isolators on silicon optical circuits using "laser annealing," a localized heat treatment method using laser light.
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Kyocera and Tohoku University's Research Institute of Electrical Communication have jointly developed, for the first time in the world, a technology to integrate optical isolators on silicon optical circuits using "laser annealing," a localized heat treatment method using laser light.