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Fujifilm Expands Key Chip Material Output to Capture AI Demand

Summary by The Japan Times
It has opened a new fabrication building that will boost output of post-CMP cleaners essential for removing particles and residues from wafers after chemical-mechanical polishing.

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On the 21st, Fujifilm held an opening ceremony for a new factory building for a subsidiary that handles the semiconductor materials business in Oita Prefecture. Production capacity at the same plant for “post-CMP cleaner,” a material used for cleaning after polishing, which is essential for improving the performance of semiconductors for artificial intelligence (AI), etc. has been expanded to about 3 times that of the past, and...

·Japan
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Bloomberg broke the news in New York, United States on Friday, August 21, 2026.
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