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Considerations For The Introduction of New EUV Resist Materials To A Fab (KU Leuven, imec)
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Considerations For The Introduction of New EUV Resist Materials To A Fab (KU Leuven, imec)
A new technical paper titled “Process and materials compatibility considerations for introducing novel extreme ultraviolet resists in a fab: a guide for academia and entrepreneurs” was published by researchers at KU Leuven and imec. Abstract Excerpt “Despite having novel ideas, most researchers struggle to introduce their resist into an advanced fab, i.e., a facility where all the industrial-scale equipment for chip-making is present. The primar…
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