US EditionPublished • loading... • Updated
ASML Honors TRUMPF for New EUV Laser
Summary by EEJournal
This story is only covered by news sources that have yet to be evaluated by the independent media monitoring agencies we use to assess the quality and reliability of news outlets on our platform. Learn more here.1 Articles
1 Articles
ASML Honors TRUMPF for New EUV Laser
Veldhoven, Netherlands/Ditzingen, Germany, October 24, 2025 – On Thursday, October 23, the Dutch technology company ASML honored TRUMPF with the prestigious Supplier Award in the Technology category. The occasion marks the successful development and the “first light” of a new EUV high-energy laser, which is intended to provide the world’s most powerful microchips in ASML’s next generation of EUV lithography systems. TRUMPF recently successfully …
Coverage Details
Total News Sources1
Leaning Left0Leaning Right0Center0Last UpdatedBias DistributionNo sources with tracked biases.
Bias Distribution
- There is no tracked Bias information for the sources covering this story.
Factuality
To view factuality data please Upgrade to Premium
