Published 1 day ago • loading... • Updated 11 hours ago

Innovative Tools and Techniques Propel Gallium Oxide as the Future of Power

Researchers at Nagoya University in Japan, in conjunction with their spinout company NU-Rei Co., Ltd., have unveiled groundbreaking advancements in the growth and fabrication of gallium oxide (Ga₂O₃), a semiconductor material that is rapidly emerging as a cornerstone for next-generation power electronics. These developments promise to accelerate the commercialization of gallium oxide-based devices, which are […]

This story is only covered by news sources that have yet to be evaluated by the independent media monitoring agencies we use to assess the quality and reliability of news outlets on our platform. Learn more here.

3 Articles

Semiconductor Digest

New Tools and Techniques Accelerate Gallium Oxide as Next-Generation Power Semiconductor

Researchers at Nagoya University present six advances in gallium oxide thin-film growth, including a world-first result growing the material on low-cost silicon substrates.

11 hours ago

Read Full Article