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How TSMC managed to increase efficiency of ASML's EUV tools: System-level optimizations and in-house pellicles —chipmaker boosted EUV-driven wafer production by 30x over six years while reducing power consumption by 24%
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How TSMC managed to increase efficiency of ASML's EUV tools: System-level optimizations and in-house pellicles —chipmaker boosted EUV-driven wafer production by 30x over six years while reducing power consumption by 24%
TSMC has dramatically boosted EUV scanner throughput, pellicle performance, and energy efficiency through deep in-house innovations.
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