Langdao Silex Shows an EUV Light Source Prototype, Says Mass Production Is Three to Five Years Away

Lithography start-up provides glimpse of China’s chipmaking progress

A Chinese start-up has unveiled a prototype extreme ultraviolet (EUV) light-source machine – a component often described as the “heart” of advanced lithography systems – marking an early but critical step in Beijing’s drive for self-reliance in chipmaking equipment. At the China International Industry Fair in Shanghai, Langdao Silex displayed its self-developed EUV light-source system. Ninety per cent of the machine’s components were localised, …

Chinese Startup Unveils First EUV Light Source Prototype To Challenge ASML’s Monopoly, But Dutch Firm Won’t Be Losing Any Sleep Over This Progress

At the 26th China International Industry Fair in Shanghai, Langdao Silex, a Chinese technology startup, revealed its self-developed EUV light source prototype called the “FlintNano LPP-OXXO.” Being a core component of EUV lithography, the company states that it has secured most core components through independent R&D, with a localization rate of approximately 90%. Hearing this development could signal that China is ready to call it quits on ASML…

Langdao Silex Shows an EUV Light Source Prototype, Says Mass Production Is Three to Five Years Away

Langdao Silex, a Shanghai startup developing light sources for extreme ultraviolet lithography, showed a prototype EUV light source system for the first time at the 2026 China International Industry Fair, which is running at the National Exhibition and Convention Center in Shanghai. Staff at the booth said mass production is still three to five years away. The light source is one of the core components of an EUV scanner, the tool used to pattern…